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Keiko Harada

Chiba Institute of Technology

2

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Application of C60 to Photosensitive Diazo /PVA Resist

2008 Journal of Photopolymer Science and Technology
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ENHANCEMENT OF DRY-ETCHING DURABILITIES BY ENERGY OR ETCHANT QUENCHING WITH ALIPHATIC, AROMATIC AND ALICYCLIC HOMOPOLYMERS, POLYMER BLENDS AND COPOLYM ERS

1999 Japanese Journal of Applied Physics
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