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Xun Zhang
Xun Zhang
DuPont
Polymer
Materials science
Optoelectronics
Photolithography
Radiation
4
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40
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Behavior of candidate organic pellicle materials under 157-nm laser irradiation
2002
Andrew Grenville
Vladimir Liberman
Mordechai Rothschild
Jan H. C. Sedlacek
Roger H. French
Robert Clayton Wheland
Xun Zhang
Joe Gordan
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Citations (11)
157-nm pellicles: polymer design for transparency and lifetime
2002
Roger H. French
Robert Clayton Wheland
Weiming Qiu
Michael F. Lemon
Gregory S. Blackman
Xun Zhang
Joseph S. Gordon
Vladimir Liberman
Andrew Grenville
Roderick R. Kunz
Mordechai Rothschild
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Molecular weight-based fractionation of poly-l- and poly-d,l-lactic acid polymers via a simple inclusion compound based process
2002
Separation Science and Technology
Douglas G. Hayes
Anne-Lee Asplund
James M. Van Alstine
Xun Zhang
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Citations (2)
Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography
2001
Roger H. French
Joseph S. Gordon
David J. Jones
Michael F. Lemon
Robert Clayton Wheland
Xun Zhang
Fredrick Claus Zumsteg
Kenneth George Sharp
Weiming Qiu
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Citations (16)
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