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K. K. Berggren
K. K. Berggren
Materials science
Electron-beam lithography
Lithography
Resist
Optoelectronics
4
Papers
87
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2024
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Control of bulk superconductivity via surface-bound electric fields in ion-gated niobium nitride thin films
2020
Erik Piatti
Dario Daghero
Giovanni Ummarino
M. Colangelo
Davide Romanin
Owen Medeiros
F. Galanti
F. Laviano
Jijeesh Ravi Nair
Alessandro Sola
C. Portesi
R. Cristiano
A. Casaburi
I. Yu. Sklyadneva
Evgueni V. Chulkov
Rolf Heid
K. K. Berggren
Renato Gonnelli
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Critical-current reduction in thin superconducting wires due to current crowding
2012
Applied Physics Letters
H. L. Hortensius
E. F. C. Driessen
T. M. Klapwijk
K. K. Berggren
J.R. Clem
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Understanding hydrogen Silsesquioxane Resist for Sub-5-nm half-pitch electron-beam lithography
2009
Joel K. W. Yang
Bryan Cord
J. Chang
Sung-Wook Nam
Ki-Bum Kim
Michael J. Rooks
K. K. Berggren
W. F. van Dorp
B. van Someren
C. W. Hagen
P. Kruit
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Resist-based neutral atom lithography
1998
Joseph H. Thywissen
K. S. Johnson
R. Younkin
N. H. Dekker
K. K. Berggren
A. P. Chu
Mara Prentiss
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