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Yeh-Sheng Lin

United Microelectronics Corporation

6

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Top-coatless 193nm positive-tone development immersion resist for logic application

2015 Proceedings of SPIE
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In-line high-K/metal gate monitoring using picosecond ultrasonics

2013 Proceedings of SPIE
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High scan speed EBL containing contact hole resists with low defectivity

2013 Proceedings of SPIE
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Development of Si-HM for NTD process

2012 Proceedings of SPIE
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