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Ngalula C. Bukasa
Ngalula C. Bukasa
Methyl methacrylate
Micrometer
Methacrylate
Photolithography
Thermal stability
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Evaluation of TER-SYSTEM resist for 193-nm imaging
1997
Donald W. Johnson
Matthew I. Egbe
Cindy X. Chen
Lin Lin
Yihua Liao
Ngalula C. Bukasa
Yasuhiro Suzuki
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