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Janardan Upadhyay
Janardan Upadhyay
Physics
Plasma
Plasma etching
Glow discharge
Etching
5
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Demonstration of the Wakefield Acceleration in an 11.7 GHz Photonic Band Gap Accelerator Structure
2018
Janardan Upadhyay
Manoel Conde
Qiang Gao
Nicole Neveu
J. G. Power
Jiahang Shao
Evgenya I. Simakov
Eric Wisniewski
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Simulations and Measurements of the Wakefield Loading Effect in Argonne Wakefield Accelerator Beamline
2018
Janardan Upadhyay
Manoel Conde
Qiang Gao
Nicole Neveu
J. G. Power
Jiahang Shao
Evgenya I. Simakov
Eric Wisniewski
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Plasma processing of superconducting radio frequency cavities
2016
Janardan Upadhyay
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PLASMA ETCHING RATES AND SURFACE COMPOSITION OF BULK NIOBIUM TREATED IN Ar/Cl2 MICROWAVE DISCHARGE
2008
Marija Raskovic
Janardan Upadhyay
Anne-Marie Valente
H. Phillips
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High etching rates of bulk Nb in Ar/Cl2 microwave discharge
2008
Applied Physics Letters
Marija Raskovic
Janardan Upadhyay
H. Phillips
Anne-Marie Valente
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