SiX2 (X = S, Se) Nanowire Gate-All-Around MOSFETs for Sub-5 nm Applications
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Abstract:
The gate-all-around (GAA) field-effect transistor (FET) holds great potential to support next-generation integrated circuits. Nanowires such as carbon nanotubes (CNTs) are one important category of channel materials in GAA FETs. Based on first-principles investigations, we propose that SiX2 (X = S, Se) nanowires are promising channel materials that can significantly elevate the performance of GAA FETs. The sub-5 nm SiX2 (X = S, Se) nanowire GAA FETs exhibit excellent ballistic transport properties that meet the requirements of the 2013 International Technology Roadmap for Semiconductors (ITRS). Compared to CNTs, they are also advantageous or at least comparable in terms of gate controllability, device dimensions, etc. Importantly, SiSe2 GAA FETs show superb gate controllability due to the ultralow minimum subthreshold swing (SSmin) that breaks "Boltzmann's tyranny". Moreover, the energy-delay product (EDP) of SiX2 GAA FETs is significantly lower than that of the CNT FETs. These features make SiX2 nanowires ideal channel material in the sub-5 nm GAA FET devices.Keywords:
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ac conductance (G) measurements in the frequency domain are used to monitor the degradation of the inversion layer response in metal-oxide-semiconductor field-effect transistors (MOSFET’s) due to high field stressing. The admittance of the conduction channel of the MOSFET’s is analyzed by use of a transmission line model. The time constant which governs the frequency response of the MOSFET inverted channel is extracted from the peak of the G/ω vs ω curve and is shown to be an important and sensitive parameter for studying the degradation of MOSFET interface properties after high field stressing. Measured data on 9 and 35 nm gate oxide MOSFET’s showed that the channel response degradation by high field stressing depends strongly on the gate oxide thickness.
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Silicon nanowires
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