Electrochemical Properties of SnSe Thin Film Electrode Fabricated by Pulsed Laser Deposition
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Ablation plasma generated by an intense, pulsed ion beam was used for thin-film deposition of commercially interesting materials such as (Ba/sub x/, Sr/sub 1-x/)TiO/sub 3/. The deposition has been carried out in vacuum and with the substrate at room temperature. The deposited thin films were analyzed by using RES, AFM, SEM and XRD. The analytical results have shown that this deposition technique is applicable to many kinds of materials with very high deposition rate and low cost.
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Ion beam-assisted deposition
Ion plating
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DLC thin films have been fabricated by pulsed laser deposition with various deposition parameters. The characterization of the fabricated thin films were seriously changed by deposition parameters. As the film growth energies provided by the deposition temperature and the laser energy density were highly increased, the film showed graphite properties because the bonding of DLC thin film was broken. The measurement of sheet resistance confirmed the above results. So the growth energy should be optimized to fabricate high quality DLC thin films. DLC thin film showed high hardness and its friction coefficient was measured to be about 0.1 regardless of the load of the ball pin.
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Recent market developments in electronic and opto-electronic devices based on small organic molecules and polymers is driving the search for a variety of new processing tools for thin-film deposition. In this paper, we describe a new vacuum-phase thin-film deposition technique — resonant infrared pulsed laser deposition — that is a true vapor phase deposition technique for thermally labile or photochemically sensitive organics and polymers. Several examples of thin-film deposition, including structural, insulating and conducting polymers, are presented. Specifications for a commercial thin-film deposition based on this technique are also discussed.
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Vacuum deposition
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Li x La y Sr z MnO3 thin films of various compositions (x,y,z) have been grown using pulsed laser deposition. The compositions of the films have been studied as a function of deposition temperature, target-to-substrate distance and deposition pressure with respect to different cation ratios of the targets by inductively coupled plasma mass spectrometry. When growing multi-elemental oxide thin films containing lithium (with its large mass difference to other elements), lithium loss is most probably inevitable. But the desired thin film composition can be achieved by selecting specific growth conditions and different target compositions. The experiments also elucidate some of the mechanisms behind the incongruent lithium transfer from the targets to thin films.
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.Pulsed Laser Deposition (PLD) is a powerful technique to grow thin films. Oxides, Magnetics and superconducting materials have been obtained by PLD and theirs properties are strongly dependent of deposition parameters. The construction of a simple and cheap PLD system that is suitable for growing various thin films, including magnetic materials, controlling some deposition parameters is presented. The design characteristics and construction are presented for each one of the devices that compose this PLD system. The equipment has the possibility of carrying out films deposition using up to five targets under controlled atmosphere and substrate temperature. The system also allows controlling the cool off sample time after growing up films at high temperatures. A wide range of relative speeds between target and substrate axial rotation can be externally controlled. With the configuration and the dimensions adopted in their construction, a PLD system of great experimental flexibility is achieved, at a very low cost regarding the commercial systems. To evaluate their performance and effectiveness, the deposition characteristics of a BaFe12O19 film on (0001) sapphire substrate is presented.
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In this paper, the progress of LiNbO3 thin films formation was simulated by kinetic theory method. The whole Plused Laser Deposition (PLD for short) process was considered: LiNbO3 particles were sublimated to high density plasma after laser erosion and propagated into space and then deposited into thin films. And the thickness of LiNbO3 thin films was discussed, which reflected the surface roughness and crystal type.The particles speed and distribution in the plasma were considered and discussed, and the roughness distribution of the films along the radius has been discussed. The thickness change could indicate the growth mode of the films along the radius. The detailed explanation of the PLD experiment was established.
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