Characteristics of W Doped Nanocrystalline Carbon Films Prepared by Unbalanced Magnetron Sputtering
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Nanocrystalline tungsten doped carbon (WC) films were prepared by unbalanced magnetron sputtering. Tungsten was used as the doping material in carbon thin films with the aim of application as a contact strip in an electric railway. The structural, physical, and electrical properties of the fabricated WC films with various DC bias voltages were investigated. The films had a uniform and smooth surface. Hardness and frication characteristics of the films were improved, and the resistivity and sheet resistance decreased with increasing negative DC bias voltage. These results are associated with the nanocrystalline WC phase and sp(2) clusters in carbon networks increased by ion bombardment enhanced with increasing DC bias voltage. Consequently, the increase of sp(2) clusters containing WC nanocrystalline in the carbon films is attributed to the improvement in the physical and electrical properties.Keywords:
Nanocrystalline material
Cavity magnetron
Carbon fibers
Biasing
Abstract The relevance of magnetron sputtering to obtain conductive metallized coatings with a thickness of up to tens of micrometers is indicated. Attention is paid to the features of magnetron sputtering with a liquid target. It is noted that this process is currently being implemented using magnetrons with size from 3” to 6”. The design flaws of the existing NMSA-52M magnetron and its mounting unit to the chamber of the vacuum coating system MVTU-11-1MS are considered. The design of a magnetic system with an increased value of magnetic induction on a 2” magnetron surface has been developed. The magnetron sputtering source were designed: a housing, a chamber mounting unit and a cover. As a result, a variant of the improved design of the magnetron sputtering source is presented, which takes into account the disadvantages of the existing NMSA-52M magnetron.
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The investigations of (Ti + Al)-SiO 2 surfacing by magnetron deposition are presented in this article. The correlation between film`s thickness deposited on the particles by mechanocomposites and magnetron sputtering time was established. It was determined that the rational time for surfacing by Ti-Al mechanocomposites system is about 40 minutes. According that deposition time the thickness of deposited SiO 2 films were obtained as 5.2 microns.
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The mid-frequency (20–350 kHz) pulsed magnetron sputtering process has been reported as an enabling technology for the deposition of a wide range of commercially important coatings onto large area glass components. In this study, transparent titania (TiO2) coatings were deposited by reactive unbalanced magnetron sputtering in a Large Area rig built 'in-house' and designed to replicate an in-line coater. Deposition took place in continuous DC, pulsed DC (40, 100, 200 and 300 kHz) and AC (40 kHz) modes. The films were deposited under different magnetron configurations; single and dual planar magnetrons operated in conventional mode, and dual planar magnetrons operated in full-face erosion (FFE) mode. A calibration run was carried out for each setting to obtain the deposition rate. Then, a 1 µm thick coating was deposited onto float glass. During the sputtering process the substrates were reciprocated in a plane parallel with respect to the magnetron. The film properties were compared and assessed in terms of their structures, optical and mechanical properties using scanning electron microscopy (SEM), X-ray diffraction (XRD), spectrophotometry and nanoindentation testing. This paper compares the properties of TiO2 produced by DC, AC and pulsed DC magnetron sputtering using different magnetron configurations (static or FFE) and attempts to relate these properties to deposition parameters.
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Magnetron sputtering is known for years as a powerful tool for coating deposition of cutting tools and machine parts. However the experimental measurements of the magnetron discharge parameters are still necessary to provide a consumer of the magnetron system with the reliable characteristics. A voltage-current relation is the most applied characteristic of the discharge, and it is described as the power low of a type U = U0 + aIn, where U and I are the voltage drop and the discharge current, respectively, and U0 and n are constant. First part of the research is dedicated to the experiments conducted in the magnetron setup provided with the titanium cathode in a vacuum chamber filled with argon or argon-nitrogen mixture, and the constants are determined for the particular geometry of the magnetron sputtering system. The obtained results can be used to choose the operation modes for the traditional applications of the magnetron discharge such as ion cleaning and heating of the non-magnetic workpieces arranged on the cathode, as well as for the sputtering deposition of the titanium and titanium nitride coatings on the surfaces of the workpieces located above the magnetron cathode. In the next part of the research the novel application of the magnetron for production of carbon nanostructures is considered. For the purpose, a layer of expanded graphite is arranged on the magnetron cathode, and the discharge is initiated in oxygen atmosphere. It was found that for the time interval of a few hours the discharge is described as a superposition of the typical magnetron glow with arc spot generation, and the intensity of the arcs is not decreased with time. At that, the arc initiation was accompanied with the formation of clusters of the graphite cathode. The process is explained in terms of the cathode spot generation at the interaction of the arc plasma with the non-melting material. This process can be beneficial for the development of the plasma reactors for the large-scale production of the carbon species at the low gas pressures suitable for the magnetron discharge operation. Thus, the magnetron sputtering systems provided with the expanded graphite cathode can be considered as the tool to grow carbon nanospecies in the arc discharge cathode spots.
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