Discussion of Limiting Deposition Power Densities in Laser Target Materials

Bulk aluminium material is chosen as targets to prepare pure Al film by the method of pulsed laser deposition(PLD).The thickness uniformity of Al film in coaxial and side-axial deposition modes is also studied comparatively.Besides,the effects of substrate temperature,laser power and repetition rate on deposition rate of Al film in side-axial deposition mode are investigated respectively.The results show that the thickness uniformity of the film gotten in side-axial deposition mode is better than that in coaxial deposition mode.The deposition rate of Al film decreases with the increase of the substrate temperature.However,the deposition rate of Al film increases with increasing laser power.Especially,there is a maximum deposition rate of Al film by varying the laser repetition rate.The above method and results can be used as a theoretical guidance for big area film deposition by PLD in application.

Pulsed Laser Deposition

Deposition

Coaxial

Ion plating

Source

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Fabrication and Properties of Nanolaminates Using Self-Limiting Surface Chemistry Techniques

Steven M. George

Abstract : Nanolaminates are multilayered thin film structures with very high interfacial density. These composite multilayer structures can display interesting properties that are not observed in the individual components. These special properties can be optimized by manipulating the thickness and composition of the individual nanolayers. The optimized nanolaminates may have important applications as better protective coatings and thin films with enhanced optical and electrical properties. Our research has focused on the fabrication of nanolaminates with atomic layer deposition (ALD) techniques based on sequential self-limiting surface chemistry. We have also concentrated on measuring the properties of nanolaminates. Our goal has been to grow and characterize metal/ceramic and ceramic/ceramic nanolaminates and to develop design rules for the construction 0 novel nanocomposite materials. We have utilized the ALD techniques that we have recently pioneered to obtain atomic layer controlled growth. We have utilized our surface chemistry for W ALD and A1203 ALD to construct W/A1203 metal/ceramic nanolaminates. We have also used our surface chemistry for ZnO and A1203 ALD to construct ZnO/A1203 ceramic/ceramic nanolaminates and alloys. Following the growth of these nanolaminates, we have determined structure/property relationships for nanolaminates.

Limiting

Self limiting

10.21236/ada415471

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Deposition of Cu2Ta4O12 by pulsed laser deposition

arXiv (Cornell University) (2003)

Andreas Heinrich Bernd Renner R. A. Lux Stefan G. Ebbinghaus Armin Reller

Cu2Ta4O12 (CTaO) thin films were successfully deposited on Si(100) substrates by pulsed-laser deposition technique. The crystalline structure and the surface morphology of the CTaO thin films were strongly affected by substrate temperature, oxygen pressure and target - substrate distance. In general during deposition of CTaO the formation of a Ta2O5 phase appeared, on which CTaO grew with different orientations. We report on the experimental set-up, details for film deposition and the film properties determined by SEM, EDX and XRD.

Pulsed Laser Deposition

Deposition

Morphology

10.48550/arxiv.cond-mat/0310155

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Self-limiting etching prior to self-limiting growth in ultra-high vacuum for obtaining clean interface

Springer proceedings in physics (2001)

Nobuyuki Otsuka Jun‐ichi Nishizawa Yutaka Oyama Hiroaki Kikuchi K. Sütö

Limiting

Self limiting

Interface (matter)

10.1007/978-3-642-59484-7_162

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Self-limiting excavation seems to increase the odds of success 1 year after deep carious lesion removal compared with a conventional protocol

The Journal of the American Dental Association (2018)

Romina Brignardello‐Petersen

Limiting

Self limiting

Odds

Carious lesion

10.1016/j.adaj.2018.05.033

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Correction: Self-limiting stoichiometry in SnSe thin films

Nanoscale (2023)

J Chin Marshall B. Frye Derrick Liu Maria Hilse Ian C. Graham

Correction for ‘Self-limiting stoichiometry in SnSe thin films’ by Jonathan R. Chin et al. , Nanoscale , 2023, 15 , 9973–9984, https://doi.org/10.1039/D3NR00645J.

Stoichiometry

Limiting

Self limiting

10.1039/d3nr90187d

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<title>Deposition parameters influences in pulsed laser deposition by plume reflection</title>

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (2003)

Aurelian Marcu C. Grigoriu Weihua Jiang Kiyoshi Yatsui

Pulsed laser deposition (PLD) is widely used to prepare various kinds of thin films. From many experimental results the film surface has been found to be strongly affected by so-called droplets, which are relatively large target material particles in solid or liquid state carried with the plume. In order to satisfy both purposes of high deposition rate and good quality by the PLD, we have investigated the plume reflection process from the viewpoint to avoid the big particles deposited on the substrate. In the present paper we investigate the influences of the system parameters on surface thin film quality and the deposition rate. Some optimization proposals are also included for this deposition technique.

Deposition

Pulsed Laser Deposition

Reflection

10.1117/12.520070

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