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    High-quality ZrO2/Si(001) thin films by a sol-gel process: Preparation and characterization
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    Abstract:
    ZrO 2 films with a sub-10-nm thickness and a roughness of about 0.2 nm have been prepared on Si(001) by a sol-gel process based on zirconium-(IV)-n-propoxide. The topography of the obtained samples has been controlled by atomic force microscopy. Chemical composition and interface reactions of the deposited films have been studied by x-ray photoemission spectroscopy and Auger electron spectroscopy. The ZrO2 films are stable against heating (up to 700 °C) in a moderate oxygen atmosphere (2×10−5 mbar oxygen partial pressure). Minor changes in the surface composition occur after rapid annealing up to 1000 °C.
    Keywords:
    Auger electron spectroscopy
    Electron spectroscopy
    Auger electron spectroscopy
    Electron spectroscopy
    Auger effect
    Energy-dispersive X-ray spectroscopy
    Although the applications of Auger electron spectroscopy in surface analysis have by far outweighed its use as a tool to investigate electron states of solids and surfaces, there are a variety of situations where Auger spectroscopy provides unique information. A part from the chemical shifts, Auger intensities are useful in determining the number of d-electron states in transition metal systems. Auger spectroscopy is a good probe to investigate the surface oxidation of metals. In addition to the intra-atomic Auger transitions, inter-atomic transitions observed in oxides and other systems reveal the nature of electron states of surfaces. Charge-transfer and hybridization effects in alloys are also usefully studied by Auger spectroscopy. Auger electron spectroscopy has not been a popular technique to investigate adsorption of molecules on surfaces, but the technique is useful to obtain fingerprints of surface species.
    Auger electron spectroscopy
    Electron spectroscopy
    Auger effect
    Citations (14)
    The relative sensitivities of Auger electron spectroscopy (AES) and x-ray photoelectron spectroscopy (XPS or ESCA) have been compared for 54 elements, using the same electron analyzer under identical experimental conditions in ultrahigh vacuum. Signal-noise ratios derived from N (E) ESCA spectra and dN (E)/dE AES spectra showed that AES is a more sensitive technique for most elements, particularly those of low atomic number. These ratios of AES and ESCA detectabilities, which varied over a range more than 2 orders in magnitude, can be used as a guide for selecting the more sensitive technique for a particular element.
    Auger electron spectroscopy
    Electron spectroscopy
    Auger effect
    Citations (14)
    Abstract ISO/TR 18394 provides guidance for the identification of chemical effects on x‐ray or electron‐excited Auger electron spectra as well as for applications of these effects in chemical characterization of surface/interface layers of solids. In addition to elemental composition, information can be obtained on the chemical state and the surrounding local electronic structure of the atom with the initial core hole from the changes of Auger electron spectra upon the alteration of its local environment. The methods of identification and use of chemical effects on Auger electron spectra, as described in this Technical Report, are very important for accurate quantitative applications of Auger electron spectroscopy. Copyright © 2007 John Wiley & Sons, Ltd.
    Auger electron spectroscopy
    Electron spectroscopy
    Chemical state
    Auger effect
    Characterization
    Citations (4)
    Auger electron spectroscopy
    Electron spectroscopy
    Characterization
    Scope (computer science)
    Citations (19)
    By direct comparison it is shown that Auger electron spectroscopy (AES) is more sensitive than appearance potential spectroscopy (APS) for the detection of S, C, and O on a Ti film. Similar combined studies of a number of clean films reveal that APS is about equally sensitive to Cr, Ti, Fe, and Ni, but is unable to detect Cu, Ag, or GaAs under the present conditions. The sensitivity of AES to all these materials in bulk form is the same within a factor of 5.
    Auger electron spectroscopy
    Electron spectroscopy
    Citations (19)
    Principle, apparatus, and measurement method of Auger electron spectroscopy have been described. Applications of this method to surface analysis of corrosion products on electronic materials, stainless steels, and electroplated Zn-Ni (13%) alloy films are also described. Advantages and limitations for Auger electron spectroscopy are pointed out. Several questions and answers for them are presented.
    Auger electron spectroscopy
    Electron spectroscopy
    Citations (2)
    Auger electron spectroscopy
    Electron spectroscopy
    Citations (45)
    Direct comparison of Auger electron spectroscopy (AES) with appearance potential spectroscopy (APS) has been accomplished. In situ determination of the respective spectra for various surface conditions of an Fe-Cr-Ni alloy has shown that the relative sensitivities of the two techniques are strongly dependent upon the surface condition and that for a given element one technique may indicate an increase with a change in surface condition while the other technique may indicate a decrease. To a first approximation, such effects may be explained in terms of the respective electronic transitions. The results suggest that AES should be employed for elemental and, in some cases, chemical analyses and APS should be reserved for the study of the chemical binding of atoms in surfaces.
    Auger electron spectroscopy
    Electron spectroscopy
    Auger effect
    X-Ray Spectroscopy
    Citations (17)