Verification of wafer-level calibration accuracy at high temperatures
3
Citation
8
Reference
10
Related Paper
Citation Trend
Abstract:
This article presents the results of accuracy verification of wafer-level calibration at high temperatures based on coplanar calibration standards. The electrical characteristics of different commercially available coplanar calibration lines were extracted and compared at different temperatures. Finally, the accuracy of lumped calibrations at variable temperatures was verified by definition of the worst-case error bounds for the measurement of passive devices and compared to the reference NIST multiline TRL.Keywords:
NIST
Accuracy and precision
Key title Zbìrnik naukovih pracʹ Odesʹkoï deržavnoï akademìï tehnìčnogo regulûvannâ ta âkostì (2014)
In this paper based on the analysis of the requirements of the new edition of the Law of Ukraine "On metrology and metrological Activity" shows that the calculation of the measurement uncertainty in the calibration of measuring instruments is obya-necessarily. General recommendations are given to reduce the time spent on evaluation of measurement uncertainty.
Standard uncertainty
Measuring instrument
Cite
Citations (1)
In the course of measurement of the high-precision low resistance,the influence of the contact resistance,resistance of conjuc- five line and the condition of measurement etc,cannot be ignored for the result of the measurement.So the selection of the suitable method of measurement is very imperlant for enhancement of confidence level.This paper particularly introduces the method of indirect measurement using a stable current source and a digital voltmeter.The analysis and evaluation of the uncertainty of measurement have been done.
Voltmeter
Accuracy and precision
High resistance
Measurement device
Level measurement
Measuring principle
Line (geometry)
Cite
Citations (0)
All measurements include some error. Whether measurements are used for accountability, environmental programs or process support, they are of little value unless accompanied by an estimate of the measurements uncertainty. This fact is often overlooked by the individuals who need measurements to make decisions. This paper will discuss the concepts of measurement, measurements errors (accuracy or bias and precision or random error), physical and error models, measurement control programs, examples of measurement uncertainty, and uncertainty as related to measurement quality. Measurements are comparisons of unknowns to knowns, estimates of some true value plus uncertainty; and are no better than the standards to which they are compared. Direct comparisons of unknowns that match the composition of known standards will normally have small uncertainties. In the real world, measurements usually involve indirect comparisons of significantly different materials (e.g., measuring a physical property of a chemical element in a sample having a matrix that is significantly different from calibration standards matrix). Consequently, there are many sources of error involved in measurement processes that can affect the quality of a measurement and its associated uncertainty. How the uncertainty estimates are determined and what they mean is as important as the measurement. The process ofmore » calculating the uncertainty of a measurement itself has uncertainties that must be handled correctly. Examples of chemistry laboratory measurement will be reviewed in this report and recommendations made for improving measurement uncertainties.« less
Propagation of uncertainty
Accuracy and precision
Sensitivity Analysis
Cite
Citations (0)
Most recently, the measurement uncertainty evaluation employs entirely for evaluating the measurement process which is also use to investigate the residual error of length measuring system. This paper presents the measurement uncertainty of the reversal errors that would be compensated by using the error with the measurement uncertainty compensation module. The confident level of measurement uncertainty is approximately 95%. This evaluation result of the measuring system errors were approximately minimized to 8.0 μm.
Propagation of uncertainty
Error Analysis
Systematic error
Accuracy and precision
Distance measurement
Cite
Citations (0)
The National Institute of Standards and Technology as the U.S. National Metrology Institute has the fundamental responsibility to continuously push the limits of measurement science (metrology) to promote U.S. innovation and industrial competitiveness. In 2004, NIST finished construction of a $235 million, 49 843 m2 Advanced Measurement Laboratory to enhance its measurement capabilities in response to the fast-growing metrology needs of the scientific and industrial community.
NIST
Dimensional Metrology
Cite
Citations (0)
The NIST Flat Panel Display Laboratory (FPDL) is operated through the Display Metrology Project (DMP) of the Electronic Information Technology Group in the Electricity Division of the Electronics and Electrical Engineering Laboratory of NIST. The DMP works to develop and refine measurement procedures in support of ongoing electronic display metrology, and applies the results in the development of national and international standards for flat panel display characterization.
NIST
Dimensional Metrology
Flat panel display
Cite
Citations (0)
Every artifact measurement standard has some uncertainty associated with its calibration, and the NIST Photomask Linewidth Standards are no exception. The methods of estimating measurement uncertainty, however, and the interpretation of its meaning, have been subjects of discussion for many years. The International organization for Standardization (ISO) has recently published a Guide to the Expression of Uncertainty in Measurement, which outlines an operational procedure for estimating and combining the effects of the various contributing factors. A new NIST policy on measurement uncertainty has led to a change in the method of determining the uncertainty of NIST Photomask Linewidth Standards to comply with ISO recommendations. Consequently, their calibration uncertainty has changed. The new method of evaluating systematic components leads to increased systematic uncertainty, and the new method of combining uncertainty components leads to reduced calibration uncertainty. This paper describes the old and new methods and compares their results.
NIST
Standard uncertainty
Traceability
Artifact (error)
Laser linewidth
Cite
Citations (8)
There are not only certain relations but also certain differences between the uncertainty of measurement and the error of measurement.The error of measurement is the basis of the uncertainty of measurement,and the uncertainty of measurement is the product of the continuous development and improvement of the classical error theory.This paper analyzes the differences and relations between the uncertainty of measurement and the error of measurement from their definitions,causes and application methods.
Basis (linear algebra)
Sensitivity Analysis
Propagation of uncertainty
Error Analysis
Cite
Citations (0)
Very important content in performance evaluation of machine tool is positioning accuracy and repeatability precision measurements of feed mechanism. A study analyses the measurement method and uncertainty factors by ISO-based test method. Reliable results can't be derived without the notion of measurement uncertainty. The reason is that the measured value includes a lot of uncertain factors. Finding the factor that affects the measurement of parameter is important for estimation of measurement precision. In this paper, the evaluation of uncertainty analysis about positioning accuracy and repeatability precision measurements of high precision feed mechanism is presented to evaluate the important factors of uncertainty.
Repeatability
Accuracy and precision
Cite
Citations (7)
This paper presents measurements of calibrated step height and pitch standards using a homodyne interferometer-based metrological scanning probe microscope (SPM) and a nanopositioning and nanomeasuring machine (NPM machine). These devices were developed at the Institute of Process Measurement and Sensor Technology of the Technische Universität Ilmenau. Together these devices are capable of highly exact dimensional and traceable long-range positioning and measurement with a resolution of 0.1 nm over the positioning and measurement range of 25 mm × 25 mm × 5 mm. Measurements of different calibrated step height and pitch standards were completed in order to test the repeatability and accuracy of the metrological SPM. The deviations between the calibrated and measured values were smaller than the uncertainty values determined by the Physikalisch-Technische Bundesanstalt (PTB) calibration. The extended uncertainty of the measurement results (step height or mean pitch value) was less than 1 nm.
Repeatability
Nanometrology
Accuracy and precision
Dimensional Metrology
Cite
Citations (10)