Femtosecond Laser Nanofabrication of Metal Structures Through Multiphoton Photoreduction
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Nanoimprint lithography
In this paper,a 3D femtosecond laser micro-nanofabrication system has been built. CAD model of 2D picture conversion data based on femtosecond laser micro-nanofabrication system have been also discussed. At last, the 2D hand model has been fabricated using the fabrication system we have built.
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Nanoimprint lithography
Soft Lithography
Polydimethylsiloxane
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Transformation Optics
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Metamaterial antenna
Photonic metamaterial
Electromagnetics
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A novel strategy for fabricating nanoimprint templates with sub-10 nm patterns is demonstrated by combining electron beam lithography and atomic layer deposition. Nanostructures are replicated by step-and-repeat nanoimprint lithography and successfully transferred into functional material with high fidelity. The process extends the capacity of step-and-repeat nanoimprint lithography as a single digit nanofabrication method. Using the ALD process for feature shrinkage, we identify a size dependent deposition rate.
Nanoimprint lithography
Next-generation lithography
Template
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Development of a novel nanofabrication process is reported for the fabrication of SiC nanoimprint templates with ultra sharp tip arrays. The process involves electron beam lithography (EBL) to pattern dot arrays, reactive ion etch (RIE) to form tip shape, oxidation/wet etch to sharpen the tips and finally silicon tips conversion into SiC to harden the tips. The resulting SiC tips are not only of high resolution for nanoimprint lithography, but also of high hardness for high pressure lithography process. Sharp tips are as small as a few nanometers. With such templates, manufacture of vacuum nano-electronic devices and large area nano-electronics can be carried out by nanoimprint lithography.
Nanoimprint lithography
Next-generation lithography
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Stencil lithography
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Abstract The work presented here describes a simple, low-cost, and unconventional technique to fabricate a 2D nanosquare array using magnetic force assisted thermal nanoimprint lithography (MF-TNIL). The nanofabrication process involves two steps: (i) fabrication of a 2D nanosquare array template on a laminated plastic sheet via sequential thermal nanoimprinting of linear nanograting polydimethylsiloxane (PDMS) stamp, and (ii) reversal imprinting of template on UV curable polymer using soft UV-nanoimprint lithography. Without using an expensive nanofabrication tool, our proposed technique can fabricate nanosquare array over an area of 1 × 1 cm 2 with individual nanosquare having a feature size of about 383 nm × 354 nm × 70 nm. We believe that our proposed MF-TNIL represents a promising nanofabrication technique that will allow fabricating various types of nanostructures for their applications in developing sensors, anti-reflective surfaces, self-cleaning surfaces, etc.
Nanoimprint lithography
Polydimethylsiloxane
Soft Lithography
Next-generation lithography
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This book will cover the recent advances and applications in metamaterials. It begins by presenting the fundamental concepts of metamaterials, including characterization. The book then moves on to discuss microwave metamaterial sensors, metamaterial absorbers in microwave range, metamaterial absorbers in high frequencies, energy harvesting application of metamaterials, seismic metamaterial, artificial intelligence applications in metamaterial antennas, frequency selective surfaces in metamaterials, metasurfaces, and biomedical applications of metamaterials. In all sections, the design procedure of artificial materials and the evaluation of constitutive parameters and related parameters including how they affect results, will be explained. Novel worked examples will be carried out in each chapter. Key features • Presents an extensive guide for the common applications of metamaterials. • Explains key points in the design and analysis of metamaterials. • Includes comprehensive examples of metamaterial applications. • Provides case studies, worked examples, end of chapter summaries.
Metamaterial antenna
Characterization
Split-ring resonator
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This chapter contains sections titled: Introduction Metamaterials Background RF LC Metamaterials RF Tunable "Meta-Surfaces" with LCs LC Tuning of Meta-Atoms Optical Metamaterials with LCs LC Interaction with Plasmonic Metamaterial Structures Liquid Crystals in Self-Assembled Metamaterials Chiral Metamaterials Conclusion Outlook References
Photonic metamaterial
Split-ring resonator
Transformation Optics
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Nanoimprint lithography
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Advanced fabrication of multiple-level three-dimensional nanostructures by step and flash nanoimprint lithography was studied. This study has been shown to be applicable to future nanofabrication endeavors in the industrial production of electronic devices and optical materials. Step and flash nanoimprint technologies using the newly fluorinated silicon-containing resist materials to prevent resist pattern collapse, contamination problem of the quartz template, and defect problems were demonstrated. High-quality nanoimprint patterning of 65 nm dense lines and other multiple-level three-dimensional nanostructures was achieved using the proposed material design and under ultraviolet nanoimprint conditions. The developed fluorinated silicon-containing resist material as a hard mask layer with a nonsilicon spin-on carbon material was found to be useful in producing high-aspect-ratio patterned structures by step and flash nanoimprint lithography.
Nanoimprint lithography
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