Structures of NO3− formed via glow discharge in atmospheric gases
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Tandem mass spectrometry experiments using both ion-molecule reactions and collision-induced dissociation (CID) in an ion trap mass spectrometer have been performed to characterize the structures of the NO3− ions that issue from an atmospheric sampling glow discharge ionization source. The experimental evidence suggests that significant abundances of at least two stable forms of NO3− can be obtained from an air-sustained glow discharge. Ab initio calculations have been performed to identify the structures of the likely isomers. Rate constants have been measured for the reaction of the less thermodynamically stable isomer(s) with carbon dioxide, and evidence is given for a new reaction, (OO−NO)− + NO2• → NO2− + O2 + NO•. The combination of em with a kinetic study is shown to be a useful approach for obtaining rate constant information when a mixture of reactive and unreactive isomers is present in the reactant population.Keywords:
Glow discharge
Materials surface properties were improved by the application of a rf glow discharge treatment for vacuum and electronic applications. The surface morphology was studied under different glow discharge treatments and it could be shown by experiments that the roughness of materials surface varied due to the glow discharge treating process and that a clean and smooth surface could be obtained after the treatment. The experimental results revealed that the outgassing rates for different gases decreased and the evacuating properties for the materials improved following the application of the glow discharge treatment.
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Outgassing
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All of our projects involve the glow discharge source as our basic research focus. Our primary effort is glow discharge mass spectrometry, but we frequently use complementary procedures such as atomic absorption and atomic emission in the glow discharge to obtain useful information about plasma processes. Our overall goal is to gain a better understanding of the glow discharge and to bring it to bear on real analytical problems.
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SIESTA (computer program)
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In the Fischer–Tropsch synthesis (FT) process the mechanism of CO dissociation is of fundamental importance. In this study we compare hydrogen-assisted CO dissociation mechanisms to direct CO dissociation on the B5 site as exposed on the fcc-Co(211) surface. Whereas direct CO dissociation is calculated to have an overall barrier of 142 kJ mol−1, the alternative mechanism involving a HCO intermediate proceeds with a lower overall barrier of 123 kJ mol−1. Using these calculated values we show that hydrogen-assisted CO dissociation will result in an overall rate corresponding to the same order as the considered FT experiments.
Activation barrier
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The effects of experimental conditions (i.e., flow rate, pressure, discharge wattage, and glow characteristics) on the plasma polymerization of acrylonitrile were investigated. It was found that the glow characteristic is highly dependent on both flow rate and discharge wattage and that the plasma polymerization depends strongly on the glow characteristic. However, when experimental conditions are selected to maintain a fully developed glow in the tail flame portion of rf discharge, plasma polymerization is independent of discharge wattage and pressure. The polymer deposition rate is linearly proportional to the monomer flow rate. The deviations from this ideal situation are generally attributable to incomplete glow or partial glow under conditions which caused the deviation. The “character” of the glow largely determines the chemistry of the system. Consequently, the properties of polymers formed under different glow characteristics are also different.
Glow discharge
Plasma polymerization
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Abstract This International Standard gives guidelines for the use of glow discharge optical emission spectrometry (GDOES) for bulk and depth profile analysis of rigid solids. The sample is sputter etched in a glow discharge device and the element‐characteristic optical emission recorded simultaneously. The standard specifies the type of equipment used and gives general guidelines for the operation of such equipment. Measuring techniques and procedures for verification of analytical results also are given. Copyright © 2002 John Wiley & Sons, Ltd.
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Through the experiment of glow discharge in several holes of different diameters,we discover that the glow discharge goes out at the diameter D = 2 dk,and some glow discharging holes of them are bright and the others are dark.Using similarity principle of discharge,we have designed a glow and pressure observer which can be placed in different parts of the furnace to be able to observe the uniformity of temperature,pressure and glow discharge.Its manufacture and use are very easy and convenient.
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Observer (physics)
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Glow discharge
Trimethylsilane
Residual gas analyzer
Monatomic gas
Plasma polymerization
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Nuclear Magnetic Resonance has recently been used to establish the existence of two separate hydrogen environments in glow discharge deposited a‐Si:H. Here we compare our results for sputtered films with those obtained for glow discharge samples. The sputtered films have more hydrogen in the highly clustered environments than do the glow discharge films. In addition, flims prepared with a low partial pressure of hydrogen in the sputtering gas show no minimum in the spin lattice relaxation time T1 as a function to temperature, unlike the glow discharge films where a minimum in T1 is observed. This minimum, which is attributed to relaxation via disorder modes, is also seen in a sputtered film prepared under a high partial pressure of hydrogen.
Glow discharge
Partial pressure
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A wide variety of organic polymer thin films have been formed in a glow discharge. In 1960, Goodman described the formation of films in a glow discharge from hydrocarbon vapors (1). In 1963, Bradley et al. described films produced from many organic substances in a glow discharge (2). Polymerized thin films have been formed by several methods such as glow discharge, photolysis, electron bombardment and vacuum evaporation. The films formed in a glow discharge are pinhole free and possess a number of unique and desirable properties. The glow discharge methods are also simpler than the other methods from a processing point of view. Two different methods are used to form thin films in a glow discharge method, an a.c. or d.c. glow discharge is initiated between the electrodes, and the electrodes serve as the substrate for film formation. In the indirect method, the substrate is placed in the plasma formed
Glow discharge
Plasma polymerization
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