Decay behaviour of UV-induced defects in Ge-doped SiO/sub 2/ glass
0
Citation
8
Reference
10
Related Paper
Abstract:
Decay behaviour of photo-induced defects in a Ge-doped SiO/sub 2/ glass with photosensitivity and 2nd-order optical nonlinearity has been presented. It has been found that the decay of induced GeE' in a UV-irradiated glass is quite different from that in a UV-poled glass.Keywords:
Photosensitivity
The design of photosensitivity measuring instrument was analyzed in the paper.The photosensitivity of solar cells prepared from blend systems of polythiophene(P3HT(poly(3-hexyl thiophene)) and C60 derivative PCBM(-phenyl C61-butyric acid methyl ester) was measured with self-made photosensitivity measuring instrument,and the reasons for the changes in the photosensitivity of solar cells were analyzed.
Photosensitivity
Cite
Citations (0)
Abstract The photosensitivity in cis ‐polyphenylacetylene ( cis ‐PPA, polymerized with rare‐earth catalysts) can be significantly enhanced by doping the PPA with I 2 or FeCl 3 and sensitizing with 4‐isothiocyanatofluorescein (F‐II) or 2,4,7‐trinitro‐9‐fluorenone (TNF), which are powerful sensitizers. The electrophotographic photoreceptor (P/R) device with cis ‐PPA + F‐II (on Al substrate) appeared preferable in photosensitivity enhancement and showed good photosensitivity: dark decay 1,8 V/s; maximum rate of discharge 321 V/s; residual surface potential 22 V; discharge 89, 1%; photosensitivity 2,96 s −1 . This is a new “family” of photosensitive materials which can be used in a duplicator.
Photosensitivity
Cite
Citations (3)
Abstract Several polyvinylesters of substituted cinnamylideneacetic acids were synthesized and their photosensitivities were investigated. It was found that polyvinylesters of planar acids reacted photochemically effectively and were spectrally sensitized by usual triplet sensitizer. On the other hand, polyvinylesters of twisted acids exhibited poor photosensitive properties. Poly(vinyl α‐cyanocinnamylideneacetate) (PV‐V) was found to be an excellent photosensitive polymer with respect to both photosensitivity and thermal stability (or storage stability).
Photosensitivity
Thermal Stability
Cite
Citations (28)
The acid proliferation reaction of tert-butyl 2-methyl-2-(tosyloxymethyl)acetoacetate to liberate the corresponding sulfonic acid by the action of a tiny amount of photogenerated acid was investigated in positive- and negative-working chemically amplified photoresists. The addition of the acetoacetate as an acid amplifier to the photoresists resulted in a marked improvement in contrast, while the level of photosensitivity enhancement was relatively small for both types of photoresists, showing that the inconspicuous enhancement of photosensitivity is due to the suppression of the diffusion of acidic species in polymer films. The marked improvement of photosensitivity was achieved by the fabrication of novel double-layered photoresists doped with the acid amplifier.
Photosensitivity
Sulfonic acid
Photoresist
Cite
Citations (11)
Photosensitivity has recently been reported as a feature of the Smith–Lemli–Opitz syndrome (SLO). The aim of this study was to establish the photobiological features of this disorder and to examine the hypothesis that the photosensitivity is caused by the high levels of 7-dehydrocholesterol found in SLO. All known cases of SLO in the U.K. were reviewed and clinical details of photosensitivity were recorded in detail. The action spectrum of the photosensitive eruption was defined by monochromator light testing. Thirteen of the 23 subjects (57%) had severe photosensitivity, and in 10 there was no photosensitivity. No correlation was identified between levels of 7-dehydrocholesterol and severity of photosensitivity, suggesting that the photosensitivity in SLO is not caused by a direct phototoxic effect mediated by 7-dehydrocholesterol. A novel pattern of photosensitivity was observed, with onset of a sunburn-like erythema on sun-exposed skin within minutes of sun exposure, which persisted in most cases for up to 24–48 h before fading. Monochromator light testing in three subjects showed an ultraviolet (UV) A-mediated photosensitivity eruption with greatest photosensitivity at 350 nm. Photosensitivity is a common and prominent feature of SLO and appears to be UVA-mediated. Elucidation of its biochemical basis may provide insight into normal cutaneous protective mechanisms against UVA-induced photodamage, and also sun sensitivity in general.
Photosensitivity
Phototoxicity
Erythema
Sunburn
Smith–Lemli–Opitz syndrome
Cite
Citations (46)
The photosensitivity of hybrid UV curing system composed of Si containing polyurethane acrylate oligomer ISAE and epoxy compounds was amplified and the value of photosensitivity was 218 5 mJ/cm 2 when the weight ratio of triethyleneglycol diacrylic ester(TEGDA) to ISAE was 1∶2. N Vinylpyrrolidone(NVP),the reactive diluent with tert amino group,decreased photosensitivity of the hybrid systems and the values of photosensitivity were more than 1980 mJ/cm 2.Photosensitivity and gel yield of hybrid system were increased by adding the mixture of cationic reactive diluents EPON-812 and ERL-4221,and the value of photosensitivity of hybrid system dropped to 105 6 mJ/cm 2.
Photosensitivity
Diluent
Oligomer
UV-Curing
Cationic polymerization
Cite
Citations (0)
Photosensitivity
Cite
Citations (2)
The UV photosensitivity of GeO2-doped fibers and waveguides can be increased by loading with H2 at high pressure,1,2 but to date, H2-loaded P2O5-doped glass has not shown photosensitivity at 248 nm.1,3 Heating a glass causes a shift of the UV edge to longer wavelengths,4 increasing the photon-glass interactions. In this work we show that heating (200-450°C) increases the UV photosensitivity of H2-loaded GeO2-doped fibers and brings on 248-nm photosensitivity in H2-loaded P2O5-doped fibers.
Photosensitivity
Ultraviolet
Cite
Citations (4)
Photosensitivity
Silicate glass
Cite
Citations (33)
Photosensitivity
Porphyria cutanea tarda
Cite
Citations (9)