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Development of dry‐nano‐polishing technique using reactive ion etching for ultra thin titanium wafer
Development of dry‐nano‐polishing technique using reactive ion etching for ultra thin titanium wafer
2021
Teruya Chino
Yuta Watanabe
Yosuke Tsukiyama
Masayuki Sohgawa
Takashi Abe
Keywords:
Polishing
Nanotechnology
Reactive-ion etching
Materials science
Plasma
Titanium
Wafer
Nano-
Correction
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