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CVD方法によるAlN膜合成のメカニズムと制御 ( 窒化アルミニウム(AlN))
CVD方法によるAlN膜合成のメカニズムと制御 ( 窒化アルミニウム(AlN))
1991
hirosi komiyama
ki syun kin
tosio oosawa
yasuyuki etou
Hiroshi Komiyama
Hee Joon Kim
Toshio Osawa
Yasuyuki Egashira
Keywords:
Particle
cluster size
Chemical vapor deposition
Molecular physics
Sticking probability
Materials science
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