AFM study of a SiC film grown on Si(1 0 0) surface using a C2H4 beam

Abstract A 3C-silicon carbide (SiC) thin film grown on a Si(1 0 0) surface using an ethylene (C 2 H 4 ) molecular beam has been studied by atomic force microscopy. At the center of the irradiation area of the ethylene beam, the shape of the SiC islands was rectangular, the average length of which was 74.5 nm and the average height was 13.1 nm. Each SiC island consists of the SiC particles with the average diameter of 17 nm. Just inside of the boundary region of the beam irradiation, the average size and height of the islands decreased to 50.1 and 8.2 nm, respectively. Just outside of the boundary region, the average size and height decreased to 17.7 and 5.1 nm, respectively. The average reaction probabilities at the above three points were estimated to be 0.14, 0.27 and 2.7%, respectively. New growth mode of the crystal growth is proposed (particles gathering island mode).