Evaluation of the dynamic range and spatial resolution of nonadiabatic optical near-field lithography through fabrication of Fresnel zone plates

Fresnel zone plates (FZPs) were fabricated in order to evaluate the performance of nonadiabatic photolithography by exploiting the localized nature of optical near fields. This novel photolithography scheme could realize FZPs with structures smaller than the wavelength of the light source used for exposure. The FZP for 325-nm-wavelength UV light could focus the incident light to a spot size of 590 nm. An FZP for focusing soft X-rays was also fabricated and, compared to conventional adiabatic photolithography, showed higher-contrast zones over the whole area of the FZP. This method exhibits a high dynamic range and good spatial resolution, and it was free from artifacts due to the interference of the residual propagating exposure light transmitted through the aperture of the photomask.