Thin Films and Nano-Objects of Molecule-Based Materials

2004 
Mastering the processing of molecule-based materials as thin films or nano-objects remains a challenge for the application of such materials in devices. A selection of techniques that can be applied to grow thin films and/or nanowires of molecule-based materials is described. These techniques can be divided in two categories: deposition using a gas phase reaction or a reaction in solution. Chemical vapor deposition (CVD) and evaporation under ultra-high vacuum (UHVD) belong to the first category while dip coating (DC) and electrodeposition (ED) belong to the second one. They are applied to grow thin films and/or nanowires of molecule-based conductors and/or magnets on various types of substrates: KBr substrates, stainless steel conversion coatings (SSCC), silicon conversion coatings (SiCC), Si(OOl) wafers, and nanorough silicon surfaces (NRSi). Within the molecule-based materials, formation and characterization of nanowires and films of conductive TTF.TCNQ and TTF[Ni(dmit)2]2 are considered. Thin films of molecule-based magnets including the TCNE molecule, i.e. [Fe(Cp*)2]TCNE and M(TCNE)2 phases, where M = V, Cr, Nb, Mo, are studied. Multifunctional materials as [TTF(OH)TEMPO]TCNQ, which may combine conductive and magnetic properties, and (BETS)4[Fe(CN)5NO], where conductive and photochromic properties may interact, are also discussed.
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