Use of Optical Contrast To Estimate the Degree of Reduction of Graphene Oxide

We report an optical contrast study of graphene oxide on 72 nm Al2O3/Si(100) and 300 nm SiO2/Si(100) as a function of its reduction degree. The reduction has been performed by means of ultrahigh vacuum thermal annealing from 25 °C (pristine graphene oxide) to 670 °C. In parallel to the optical contrast investigation, performed with optical microscopy, the graphene oxide films have been characterized with core level X-ray photoemission spectroscopy and micro-Raman spectroscopy. The optical contrast of graphene oxide (normalized to the one measured for pure graphene) on both substrates ranges from ∼0.4 to 1.0 for pristine and 670 °C annealed graphene oxide, respectively. Optical microscopy and X-ray photoemission spectroscopy data have been cross-correlated, leading to calibration graphs that demonstrate that just by simply measuring the optical contrast of graphene oxide one can determine with very good approximation the fraction of sp2 hybridized carbon.