Substrate treatment plant

The substrate processing system having a conditioning chamber (1) having an inlet lock and an outlet lock, as well as within the system chamber (1) transport means (2) for transporting the substrates (3) in a transport direction (4) of the inlet lock to the exit lock and at least one heating device for heating comprises substrates (3), wherein the heating means comprises a plurality of quartz tube heater (5) with a quartz tube (51), arranged at least one in the quartz tube (51) heating element (54) and power terminals to a terminal end (52) of the quartz tube (51) are arranged, wherein the terminal end (52) of the quartz tube (51) is angled and by means of a vacuum passage (6) to the outside of the installation chamber from the inside (1) is performed so that the power connections outside the installation chamber (1) are arranged, and wherein the energy output of a plurality of quartz tube heaters heater (5) formed by sections of variable gesta ltet is that at least a quartz tube heater (5) includes a heating element (54) which extends only over a part of the total length of the straight rod (53).