Method for preparing vertical silicon-based three-dimensional structure

The invention relates to a method for preparing a vertical silicon-based three-dimensional structure, and belongs to the preparation field of three-dimensional structures through wet chemical corrosion. The method is characterized in that a vertical silicon three-dimensional structure is prepared by using a chemical corrosion method under low temperature; compared with the traditional wet chemical method for preparing a three-dimensional structure, the method is high in practicability, solves the problem of steep performance of three-dimensional structures with various shapes, and is unlimited by graphical shapes and crystal orientation. The method has an extremely wide application prospect in the field of microsensors, integrated circuit manufacturing and the like.