Molecular beam epitaxial growth of low‐resistivity ZnSe films

1979 
Single‐crystalline films of low‐resistivity ZnSe have been successfully grown by molecular beam epitaxy (MBE). The film shows good crystallinity, having a smooth and flat surface as revealed by RHEED and SEM investigations. The resistivity of as‐grown MBE ZnSe is low (typically ∼1 Ω cm) and the mobility of the film is relatively high (typically ∼300 cm2/V sec) at room temperature. The concentrations of the residual electrically active donor and acceptor centers are ND =8×1016 cm−3 and NA=6×1016 cm−3, respectively. The strong blue band‐edge photoluminescence peak is observed even at room temperature, and the luminescence intensity at longer wavelength is very weak.
    • Correction
    • Source
    • Cite
    • Save
    • Machine Reading By IdeaReader
    8
    References
    56
    Citations
    NaN
    KQI
    []