Reduction of tail state on boron doped hydrogenated amorphous silicon oxide films prepared at high hydrogen dilution.

Jinjoo Park1, S. M. Iftiquar1, Sunwha Lee1 2, Hyeongsik Park1, Chonghoon Shin3, Junhee Jung3, Youn-Jung Lee1, Nagarajan Balaji3, and Junsin Yi1 ∗ 1College of Information and Communication Engineering, Sungkyunkwan University, Suwon, 440-746, Korea 2Applied Optics and Energy Research Group, Korea Institute of Industrial Technology, Oryong-dong 1110-9, Buk-ku, Gwangju 506-824, Korea 3Department of Energy Science, Sungkyunkwan University, Suwon, 440-746, Republic of Korea