Study of isotropic etching behavior of CR-39(DOP) polymer through ion tracks

Abstract The same sample of CR-39(DOP) polymeric foil has been exposed to 209 Bi (11.4 MeV/u) ions at three different angles (30°, 45° and 60°) of incidence. The exposed sample has been etched chemically and various parameters of the etched tracks have been measured. The objective of the present study is to establish the isotropic etching behavior of CR-39(DOP) polymer.