Hf1−xSixO2 Nanocomposite Coatings Prepared by Ion-Assisted Co-Evaporation Process for Low-Loss and High-LIDT Optics

Hf1−xSixO2 nanocomposites with different SiO2 doping ratios were synthesized using an ion-assisted co-evaporation process to achieve dense amorphous Hf1−xSixO2 coatings with low loss and a high laser-induced damage threshold (LIDT). The results showed that the Hf1−xSixO2 nanocomposites (x ≥ 0.20) exhibited excellent comprehensive performance with a wide band gap and a dense amorphous microstructure. High-temperature annealing was carried out to ensure better stoichiometry and lower absorption. Precipitation and regrowth of HfO2 grains were observed from 400 °C to 600 °C during annealing of the Hf0.80Si0.20O2 nanocomposites, resulting in excessive surface roughness. A phenomenological model was proposed to explain the phenomenon. The Hf1−xSixO2 nanocomposites (x = 0.3 and 0.4) maintained a dense amorphous structure with low absorption after annealing. Finally, a 1064-nm Hf0.70Si0.30O2/SiO2 high-performance reflector was prepared and achieved low optical loss (15.1 ppm) and a high LIDT (67 J/cm2).