Fabrication and Properties of Patterned Nichrome Thin Film Using MEMs Technology

A patterned nichrome thin film used for strain gauge was prepared on the glass substrate using microelectromechanical system (MEMS) micromachining process. The nichrome sensitive element had a width of 10μm and a thickness of 0.3μm. The electrical properties of the nichrome film were investigated, and a stable TCR of 1.2×10-4/°C was obtained.