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Fully Optimized Cu based process with dedicated cavity etch for 1.75μm and 1.45μm pixel pitch CMOS Image Sensors
Fully Optimized Cu based process with dedicated cavity etch for 1.75μm and 1.45μm pixel pitch CMOS Image Sensors
2006
Cohen
Roy
Herault
Cazaux
Gandolfi
Reynard
Cowache
Bruno
Girault
Vaillant
Barbier
Sanchez
Hotellier
Leborgne
Augier
Inard
Jagueneau
Zinck
Michailos
Mazaleyrat
Keywords:
Dot pitch
Dark current
Materials science
Image sensor
CMOS
Optoelectronics
Process (computing)
Correction
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