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Development of amorphous polyphenol resists with low molecular weight and narrow dispersion for EB lithography
Development of amorphous polyphenol resists with low molecular weight and narrow dispersion for EB lithography
2004
Taku Hirayama
Daiju Shiono
Shogo Matsumaru
Toshiyuki Ogata
Hideo Hada
Junichi Onodera
Tadashi Arai
Toshio Sakamizu
Atsuko Yamaguchi
H. Shirai
Hiroshi Fukuda
Mitsuru Ueda
Keywords:
Analytical chemistry
Amorphous solid
Polymer
Optics
Surface roughness
Materials science
Polyphenol
Dispersion (optics)
Lithography
Resist
amorphous semiconductors
Optoelectronics
Correction
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