System alignment patterns on a substrate by lithography stencil.

Alignment system patterns on a substrate by lithography stencil. The main object of the present invention is a system for aligning two or more patterns on a substrate using lithography stencil vacuum, so that optimal alignment accuracy is achieved. More particularly, it is an alignment system patterns based on providing a mass sensor capable of detecting the emitted material in a known position behind the stencil, so that the position of the latter depending on the signal known issued sensor.