CORRELATION BETWEEN IMPURITIES. DEFECTS AND CELL PERFORMANCE IN SEMICRYSTALLINE SILICON

An in-depth analysis of Solarex CDS semicrystalline silicon has been performed and correlations between the efficiency and impurities, and defects present in the material have been made. Comparisons were made between cell performance and variations in interstitial oxygen, substitutional carbon, grain size, etch pit density, and trap location as a function of position in the ingot. The oxygen concentration was found to decrease with increasing distance from the bottom of the ingot while the carbon concentration as well as average grain size was found to increase. The best cell performance was obtained on wafers with minimum oxygen and maximum carbon (top). No correlation was found between etch pit density and cell performance. DLTS and JVT measurements revealed that samples with higher oxygen content (bottom) gave lower cell performance due to a large number of distributed states, possibly due to extended defects like oxygen precipitates. Low oxygen samples (top) showed predominately discrete states, improved cell performance and a doping dependent average trap density.