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Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography
Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography
2018
Xiaoman Peng
Yafei Wang
Jian Xu
Hua Yuan
Liangqian Wang
Tao Zhang
Xudong Guo
Shuangqing Wang
Yi Li
Guoqiang Yang
Keywords:
Composite material
Materials science
Lithography
Analytical chemistry
Extreme ultraviolet lithography
molecular glasses
high resolution
Optoelectronics
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