method for manufacture of high purity copper powder use of plasma

PURPOSE: A method of manufacturing high purity copper powder using plasma is provided to improve a problem with the flying of low melting point of raw powder due to evaporation by properly applying the injection speed(2~30kg/hr) of raw powder when passing a plasma torch and the length(2~30kg/hr) of a reacting container. CONSTITUTION: A method of manufacturing high purity copper powder using plasma comprises next steps. Metallic powder is manufactured using a device consisting of a raw-material supply unit, a plasma torch unit and a reacting container. Copper powder with 30~450μm of average particle diameter is put into the plasma torch and the reacting container at 2~30kg/hr of injection speed and thus the average particle diameter of the copper powder becomes 5~300μm. The length of the reacting container is formed as 1.4m~2.5m. The purity of the copper powder with 5~300μm of average particle diameter is 4N class(99.99%) or higher.