Improvements in bandwidth and wavelength control for XLR 660xi systems

As chipmakers continue to reduce feature sizes and shrink CDs on the wafer to meet customer needs, Cymer continues developing light sources that enable advanced lithography, and introducing innovations to improve productivity, wafer yield, and cost of ownership. In particular, the architecture provides dose control and improved spectral bandwidth stability, both of which enables superior CD control and wafer yield for the chipmaker. The XLR 660ix incorporates new controller technology called ETC for improvements in spectral bandwidth stability, energy dose stability, and wavelength stability. This translates to improved CD control and higher wafer yields. The authors will discuss the impact that these improvements will have in advanced lithography applications.