Precipitate-free epitaxy of YBa2Cu3O7−δ by atomic control of step arrays on vicinal SrTiO3 (1 0 0) substrates

Abstract We have developed a new method which enables us to atomically control the height and the periodicity of the step distribution on vicinal SrTiO 3 (1 0 0) substrates. This method also enables us to obtain precipitate-free epitaxy of oxides. Practically thick YBa 2 Cu 3 O 7− δ films grown on such terraced vicinal substrates exhibited a regular epitaxial growth, and smooth and precipitate-free surfaces of practical device sizes.