Epitaxial growth of AlAs/sub x/Sb/sub 1-x/ by MOCVD

The deposition of AlAs/sub x/Sb/sub 1-x/ films is studied systematically using an metalorganic chemical vapor deposition growth technique. It is found that the growth of AlAsSb films requires a low V/III ratio to enhance the incorporation of antimony into the solid. The composition of the alloy also depends strongly on the growth temperature. Experimental data shows that films grown at higher temperatures yield much higher AlSb contents in the AlAs/sub x/Sb/sub 1-x/ alloys. This is contrary to the results reported for GaAsSb films. In our study, we are able to grow metastable AlAs/sub x/Sb/spl 1-x/ epitaxial films throughout the entire range of the solid composition for temperatures above 550 /spl deg/C.