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Current Status and Addressing the Challenges of Hf-based Gate Stack toward 45nm-LSTP Application
Current Status and Addressing the Challenges of Hf-based Gate Stack toward 45nm-LSTP Application
2005
Masaaki Niwa
R. Mitsuhashi
K. Yamamoto
Shigenori Hayashi
Yoshinao Harada
Aude Rothchild
T. Hoffmann
S. Kubicek
S. De Gendt
M. Heyns
S. Biesemans
Masafumi Kubota
Keywords:
Electronic engineering
Nanotechnology
Materials science
gate stack
Computer science
Engineering physics
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