Universality of transport properties of ultrathin oxide films

We report low-temperature measurements of current–voltage characteristics for highly conductive Nb/Al–AlOx–Nb junctions with thicknesses of the Al interlayer ranging from 40 to 150 nm and ultrathin barriers formed by diffusive oxidation of the Al surface. In a superconducting state these devices have revealed a strong subgap current leakage. Analyzing Cooper-pair and quasiparticle currents across the devices, we conclude that the strong suppression of the subgap resistance compared with conventional tunnel junctions is not related to technologically derived pinholes in the barrier but rather has more fundamental grounds. We argue that it originates from a universal bimodal distribution of transparencies across the aluminum oxide barrier proposed earlier by Schep and Bauer (1997 Phys. Rev. Lett. 78 3015). We suggest a simple physical explanation of its source in the nanometer-thick oxide films relating it to strong local barrier-height fluctuations in the nearest to conducting electrode layers of the insulator which are generated by oxygen vacancies in thin aluminum oxide tunnel barriers formed by thermal oxidation.