MOCVD of YBCO and Buffer Layers on Textured Ni Alloyed Tapes
2007
A RTR MOCVD was used for the deposition of YBCO and various oxides. A new MOCVD technique enable us to coat the metal tape directly without formation of NiO. At a low oxygen partial pressure the buffer layers were grown on the metal tape with good in plane and out of plane texture. The texture of the MgO buffer layers depend on the surface of the alloyed Ni-tape. YBCO layers exhibit excellent out of plane texture with FWHM(005) = 1.4 - 3.5deg and good in plane texture of FWHM(103) = 5-7deg. On MgO buffered Ni5at%W the inductive measured j c was 0.3-0.7 MA/cm 2 at 77 K.
Keywords:
- Metalorganic vapour phase epitaxy
- Nuclear magnetic resonance
- Chemical vapor deposition
- Partial pressure
- Physics
- Yttrium barium copper oxide
- Surface finish
- Inorganic chemistry
- Electrical conductor
- Metal
- High-temperature superconductivity
- Non-blocking I/O
- Deposition (law)
- Composite material
- Condensed matter physics
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