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Electrical and Physical Properties of HfO[sub 2] Deposited via ALD Using Hf(OtBu)[sub 4] and Ozone atop Al[sub 2]O[sub 3]
Electrical and Physical Properties of HfO[sub 2] Deposited via ALD Using Hf(OtBu)[sub 4] and Ozone atop Al[sub 2]O[sub 3]
2004
Hyo Sik Chang
Sungkwon Baek
Hokyung Park
Hyunsang Hwang
Jae-Hwan Oh
W. S. Shin
J. H. Yeo
Ki-Hyun Hwang
S. W. Nam
Hyun-Bae Lee
C. L. Song
D. W. Moon
Mann-Ho Cho
Keywords:
Materials science
Analytical chemistry
Ozone
Correction
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