Imprinting strategies for 100 nm lithography on polyfluorene and poly(phenylenevinylene) derivatives and their blends

Abstract We report on the use of nanoimprint lithography at room temperature (RT-NIL) for the direct structuring of polyfluorene and poly(phenylenevinylene) derivatives and of their blends without the degradation of the emissive characteristics of the active molecules. We apply RT-NIL for the fabrication of periodic one- and two-dimensional gratings with feature width that varies from 100 to 500 nm. Moreover, we analysed the effects that a superimposed periodic corrugation induces on the emitted light in terms of spectral properties and luminescence efficiency, thus ruling out any degradation of the emission. In particular, the combination of nanopatterning and active blends opens new perspectives for the control of the emitted colour from conjugated polymer films.