Sample charging measurement method and a charged particle beam apparatus

An object of the present invention, shift the focus of the charged particle beam apparatus caused by charging on the sample, to provide a change in magnification, a suitable charged particle beam irradiation method to reduce the measurement value error, and a charged particle beam apparatus. In the present invention in order to achieve the above object, in a passage of the sample is carried by the carrying mechanism of the charged particle beam, we propose a method of measuring the potential distribution on the sample by an electrostatic voltmeter to measure the potential on the sample to. Also, by measuring the local charging of the particular locations on the sample, we propose a method of measuring separate the global charge amount from the charge amount. Furthermore, the charge amount of the specific part, measured in at least two charged particle optical conditions, to measure changes in dimension measurement using a charged particle beam due to the change of the charge amount of the specific portion, based on the change measurement value, or propose a method to correct the magnification.