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MIM capacitors using atomic-layer-deposited high-kappa (HfO2)(1-x)(Al2O3)(x) dielectrics
MIM capacitors using atomic-layer-deposited high-kappa (HfO2)(1-x)(Al2O3)(x) dielectrics
2003
Hang Hu
Chunxiang Zhu
Xiongfei Yu
Albert Chin
M.F. Li
Byung Jin Cho
Dim-Lee Kwong
P.D. Foo
Mingbin Yu
Xinye Liu
J. Winkler
Keywords:
Dielectric
Analytical chemistry
Capacitor
Kappa
Chemistry
Correction
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