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Fabrication and characterization of IGZO-channel ferroelectric-gate TFTs with P(VDF-TrFE) film
Fabrication and characterization of IGZO-channel ferroelectric-gate TFTs with P(VDF-TrFE) film
2010
Lee Gwang-Geun
Yoon Sung-Min
Yoon Joo-Won
Fujisaki Yoshihisa
Ishiwara Hiroshi
Tokumitsu Eisuke
Keywords:
Thin-film transistor
Non-volatile memory
Ferroelectricity
Electronic engineering
Materials science
Communication channel
Optoelectronics
Fabrication
Correction
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