Nanoimprint curable composition, a semiconductor device and a nanoimprinting method

The present invention, [A] the polymerizable compound is a [B] a fluorine atom-containing polymer, and [C] nanoimprint curable composition containing a radical generator. The content of [B] a fluorine atom-containing polymer, with respect to [A] the polymerizable compound 100 parts by mass, preferably 10 parts by mass or less than 0.1 part by weight. The polystyrene-reduced weight average molecular weight by gel permeation chromatography [B] a fluorine atom-containing polymer is preferably 1,000 or more to 30,000 or less. [B] a fluorine atom-containing polymer, at least one structural unit selected from the group consisting of a structural unit represented by the following formula and a structural unit formula represented by (B-1) (B-2) preferably contains a polymer having.