Analysis and modeling of the experimentally observed anomalous mobility properties of periodically Si-delta-doped GaN layers

We report the anomalous mobility properties of Si-delta-doped GaN with periodically doping profile. Samples with different delta-doping periods or with varied Si source flow were investigated. It is found that for the short delta-doping-period (<26.5 nm) samples, the Hall mobility increases with decreasing electron concentration; while for the longer-doping-period samples, the situation is just the opposite. To interpret this observation, a two-layer model has been built up for long-period samples based on secondary ion mass spectroscopy measurements. The fitting results using this model are well consistent with the experimental data.