O+-Ion Implantation for Practical InP-Based Digital Optical Switches

P.J. Barrios,Siegfried Janz,Ilya Golub,Philip J. Poole,Phillip Chow-Chong,Daniel Poitras,Irwin Sproule,Mark Malloy,A. Delâge,Ross McKinnon,Barry Syrett,S. El-Mougy,S. Abdalla

O+-Ion Implantation for Practical InP-Based Digital Optical Switches

2003

P.J. Barrios
Siegfried Janz
Ilya Golub
Philip J. Poole
Phillip Chow-Chong
Daniel Poitras
Irwin Sproule
Mark Malloy
A. Delâge
Ross McKinnon
Barry Syrett
S. El-Mougy
S. Abdalla

The fabrication of Digital Optical Switches with O+ -ion implanted - electrical isolated - branches is described. Multiple- vs. single-implantation schemes and their effect on sheet resistance is compared using TLM and SIMS measurements.Copyright © 2003 by ASME

Keywords:

Sheet resistance
Optical switch
Ion implantation
Ion
Materials science
Electronic engineering
Optoelectronics
Fabrication

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