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Circular Double‐Patterning Lithography Using a Block Copolymer Template and Atomic Layer Deposition
Circular Double‐Patterning Lithography Using a Block Copolymer Template and Atomic Layer Deposition
2018
Zhixin Wan
Ha-Jin Lee
Hyun Gu Kim
Gyeong Cheon Jo
Woon-Ik Park
Seung Wook Ryu
Han Bo Ram Lee
Se-Hun Kwon
Keywords:
Self-assembly
Atomic layer deposition
Lithography
Multiple patterning
Copolymer
Analytical chemistry
Materials science
double patterning lithography
Optoelectronics
Correction
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