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Improved strained HEMT characteristics using double-heterojunction In(0.65)Ga(0.35)As / In(0.52)Al(0.48)As design
Improved strained HEMT characteristics using double-heterojunction In(0.65)Ga(0.35)As / In(0.52)Al(0.48)As design
1989
Geok Ing Ng
D. Pavlidis
M. Tutt
Jae Eung Oh
Pallab Bhattacharya
Keywords:
Chemistry
Electronic engineering
Heterojunction
Ground state
Poisson's equation
High-electron-mobility transistor
Condensed matter physics
Quantum well
Gallium arsenide
Correction
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